Authors

Yuxin Luo, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.
Jingjing Wang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.
Lu Wang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.
Ziyi Yan, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.
Yi Ma, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.
Xin Bo, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.
Jingshuang Dang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.
Zenglin Wang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi'an, Shaanxi, China, 710119.

Document Type

Article

Corresponding Author(s)

Xin Bo(box@snnu.edu.cn);
Jingshuang Dang(dangjs@snnu.edu.cn);
Zenglin Wang(wangzl@snnu.edu.cn)

Abstract

In the process of electroless cobalt plating, the saccharin additive can significantly change the surface morphology, texture orientation, and conductivity of the cobalt coating layer. When the amount of saccharin was 3 mg·L-1, the cobalt coating transformed from disordered large grains to a honeycomb structure, with a preferred orientation of (002) facet on hexagonal close-packed (HCP) cobalt crystals. The resistivity of the cobalt film decreased to 14.4 μΩ·cm, and after annealing treatment, the resistivity further decreased to 10.7 μΩ·cm. When the concentration of saccharin increases, the grain size gradually refines and presents a "stone forest" structure, with the preferred orientation remaining unchanged. The addition of saccharin also slightly improves the purity of cobalt coating to a certain extent. Through the study of the crystallization behavior of cobalt electroless plating, saccharin molecules can adsorb to specific c-sites on the cobalt dense crystal plane, inhibiting the growth of abc stacking arrangement and inducing the crystal growth in ab stacking mode, thereby achieving optimal growth of HCP (002) texture.

Graphical Abstract

Keywords

Electroless cobalt plating, Additives, Saccharin, Crystallization behavior

Online Date

3-28-2025

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