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Corresponding Author

Guozheng Li

Abstract

PS layer on n+Si with (111) orientation prepered by means of photoelectrochemically etched has photoluminescent (PL) ability like PS layer on usual nSi. The data of PL spectra and quenching are given.

Publication Date

1997-11-28

Online Available Date

1997-11-28

Revised Date

1997-11-28

Received Date

1997-11-28

References

1CanhamLT.Siliconquantumwirearayfabricationbyelectrochemicalandchemicaldissolutionofwafers.Appl.Phys.Let,1990,57(10):1046~10482贾瑞宝,王士勋,李国铮.n-Si在HF溶液中的阳极极化行为和阻抗谱.化学学报,ActaChimicaSinica1995,53:417~4243李国铮,张承乾,张强.n型多孔硅的电发光性能及其XPS和LIMA表征.电化学,1996,3:140~1434李国铮,张承乾,杨秀梅.光电化学刻蚀n+-Si的电致发光.电化学,1997,3:154~1595陈立登,季振国,马向阳,姚鸿年,劂端麟.多孔硅发光膜的研究.科学通报,1992,37:1944~19486周咏乐,金亿鑫,宁永强,元金山.多孔硅发光机理的研究.科学通报,1994,39:699~702

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