Electrochemistry and Structures of Silicon Surface

Authors

Gregory X.Zhang, Teck Cominco Metals Ltd,Ontario,Canada;Department ofChemistry,Xiaman University,Xiaman,Fujian,China;

Abstract

Accurate control and fabrication of silicon surface structures from atomic scale to micrometer scale,which may be randomly associated with surface roughness or have well defined patterns,is critical for the per-formance and reliability of electronic devices.Electrochemical reactions of silicon in solutions involved in wetcleaning and etching of silicon wafer play an importantrole in determining the structures of silicon surface.Atre-mendous amount of researches have been done in the last several decades to understand and control a range ofcomplex electrochemical reactions at silicon/solution interface and their relations to the resulted surface struc-tures.The findings generated from these research efforts have been compiled and integrated in a recently pub-lished book.This paper is to present an overview,using synthesized information from this book,on the aspect ofsilicon dissolution and the resulted surface structures.

Keywords

Silicon, Etching, Dissolution, Surface structure, Micro device fabrication, Surface reactions, MEMS

DOI Link

https://doi.org/10.61558/2993-074X.1688

Publication Date

2006-02-28

Online Available Date

2006-02-28

Revised Date

2006-02-28

Received Date

2006-02-28

Recommended Citation

Gregory X.Zhang. Electrochemistry and Structures of Silicon Surface[J]. Journal of Electrochemistry, 2006 , 12(1): 1-8.
DOI: 10.61558/2993-074X.1688
Available at: https://jelectrochem.xmu.edu.cn/journal/vol12/iss1/1

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