Abstract
The effect of halide ions on the polarization curves and stationary potential of electroless nickel plating process were studied with electrochemical methods. The acceleration and stabilization mechanism of electroless nickel deposition by halide ions also has been discussed.
Keywords
Electroless nickel deposition, Halide ions, Electrochemical methods
Publication Date
1996-05-28
Online Available Date
1996-05-28
Revised Date
1996-05-28
Received Date
1996-05-28
Recommended Citation
Keping Han, Jingli Fang.
Effect of Halide Ions on the Deposition of Electroless Nickel[J]. Journal of Electrochemistry,
1996
,
2(2): Article 15.
DOI: 10.61558/2993-074X.3075
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol2/iss2/15
References
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