Effect of Halide Ions on the Deposition of Electroless Nickel

Authors

Keping Han
Jingli Fang

Abstract

The effect of halide ions on the polarization curves and stationary potential of electroless nickel plating process were studied with electrochemical methods. The acceleration and stabilization mechanism of electroless nickel deposition by halide ions also has been discussed.

Keywords

Electroless nickel deposition, Halide ions, Electrochemical methods

DOI Link

https://doi.org/10.61558/2993-074X.3075

Publication Date

1996-05-28

Online Available Date

1996-05-28

Revised Date

1996-05-28

Received Date

1996-05-28

Recommended Citation

Keping Han, Jingli Fang. Effect of Halide Ions on the Deposition of Electroless Nickel[J]. Journal of Electrochemistry, 1996 , 2(2): Article 15.
DOI: 10.61558/2993-074X.3075
Available at: https://jelectrochem.xmu.edu.cn/journal/vol2/iss2/15