Abstract
The electrochemical reactions occurring during the deposition of nickel from Watts bath have been examined using the voltammetric technique. The important reactions taking place at the anode and cathode have been identified. The influence of buffers HAc,H_3BO_3 and NH_4Cl on the rate of nickel deposition was marked in the lower concentration (0.01-0.05 mol/L) of buffers. The reason why buffers make the rate of nickel deposition increase were discussed.
Publication Date
1998-05-28
Online Available Date
1998-05-28
Revised Date
1998-05-28
Received Date
1998-05-28
Recommended Citation
Canzh Gao, Yuli Lu, Rutao Liu, Fang Chen, Shuben Li.
Influence of buffers on the electrodeposition of nickel from a Watts bath[J]. Journal of Electrochemistry,
1998
,
4(2): Article 17.
DOI: 10.61558/2993-074X.2697
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol4/iss2/17
References
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