Influence of Buffers on the Blectrodeposition of Nickel from a Watts Bath

Authors

Can-zh GAO, Lanzhou Inst. of Chem. Phy. Chinese Acad. of Sci. Lanzhou, Gansu, 730000
Yu-li LU, Lanzhou Inst. of Chem. Phy. Chinese Acad. of Sci. Lanzhou, Gansu, 730000
Ru-tao LIU, Lanzhou Inst. of Chem. Phy. Chinese Acad. of Sci. Lanzhou, Gansu, 730000
Fang CHEN, Lanzhou Inst. of Chem. Phy. Chinese Acad. of Sci. Lanzhou, Gansu, 730000
Shu-ben LI, Lanzhou Inst. of Chem. Phy. Chinese Acad. of Sci. Lanzhou, Gansu, 730000

Corresponding Author

Can-zh GAO

Abstract

The electrochemical reactions occurring during the deposition of nickel from Watts bath have been examined using the voltammetric technique. The important reactions taking place at the anode and cathode have been identified. The influence of buffers HAc, H₃BO₃ and NH₄Cl on the rate of nickel deposition was marked in the lower concentration (0.01-0.05 mol/L) of buffers. The reason why buffers make the rate of nickel deposition increase were discussed.

Keywords

Nickel electrodeposition, Buffers, Voltammograms

DOI Link

https://doi.org/10.61558/2993-074X.2697

Publication Date

1998-05-28

Online Available Date

1998-05-28

Revised Date

1997-10-17

Received Date

1997-08-19

Recommended Citation

Can-zh GAO, Yu-li LU, Ru-tao LIU, Fang CHEN, Shu-ben LI. Influence of Buffers on the Blectrodeposition of Nickel from a Watts Bath[J]. Journal of Electrochemistry, 1998 , 4(2): 223-227.
DOI: 10.61558/2993-074X.2697
Available at: https://jelectrochem.xmu.edu.cn/journal/vol4/iss2/17