Abstract
The electrodeposition and nucleation of palladium are studied in the system of potassium citrate and ammonium oxalate. The results show that, with the additives of XP 4 and XP 7 prepared in our laboratory, a full bright palladium electrodeposits will be obtained in the wide ranges of the cathode current densities 0.5～3.5 A/dm 2 and temperature 40～60 ℃; the qualities of the thick deposits will be effectively improved by means of pulse current plating. Cyclic voltammograms results show that the division of peaks between anodic and cathodic on the electrode process of palladium will be up to 1.05 V, which shows the irreversible electrode process; and a inductive current cycle is appeared,which means the process of nucleation; XP 4 and XP 7 inhibit both palladium electrodeposition and hydrogen evolution, therefore cause the deposition potential of palladium to more negative; potential step experiments furtherly show that the nucleation of palladium obeyed progressive uncleation mechanism both with the studied additives or without them.
Keywords
Palladium, Electrodeposition, Nucleation, Pulse electroplation
Publication Date
1997-02-28
Online Available Date
1997-02-28
Revised Date
1997-02-28
Received Date
1997-02-28
Recommended Citation
Fangzu Yang, Shukai Xu, Shibing Yao, Bingyi Chen, Xueqing Zheng, Xiaohui Zhong, Shaomin Zhou.
A Study on the Electrodeposition of Palladium and it′s Nucleation[J]. Journal of Electrochemistry,
1997
,
3(1): Article 16.
DOI: 10.61558/2993-074X.3105
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol3/iss1/16
References
1RonaldJMorrissey．Rhodiumplating．PlatingandSurfaceFinishing，1995，82（8）：692JosephAAbys．Paladiumplating．PlatingandSurfaceFinishing，1995，82（8）：67～683LEPenvenR，LevasonW，PletcherD．StudiesofpaladiumelectrodepositionfrombathsbasedonPd（NH3）2X2Salts．I：［Pd（NH3）2Cl2］baths．J．Appl．Electrochem．，1992，20：399～4044LEPenvenR，LevasonW，PletcherD．StudiesofpaladiumelectrodepositionfrombathsbasedonPd（NH3）2X2．PartII：X＝BrandX＝NO2．J．Appl．Electrochem．，1992，22：421～4245JayakrishnanS，NatarajanRS．Hydrogencodepositioninpaladiumplating．MetalFinishing，1991，89（1）：23～256LaiCK，WangYY，WanCC．Paladiumelectrodepositionfromammonia－freeelectrolyte．J．Elec－troanal．Chem．，1992，322：267～2787Su－IlPyun，ChanLim．Asutdyontheelectrodepositionmechanismofplaladiumfromammoniacalsolu－tionusingarotatingPtRing－Cudiskelectrode．TRansactionsoftheInstituteofMetalFinishing，1993，71（4）：156～1608StraschilHK，AbbysJA，KudrrakEJetal．Newpaladiumstrikeimprovesadhensionandporosity．MetalFinishing，1992，90（1）：42～479KudrakEJ，AbbysJA，ChinchankarV，JJMaisano．Porosityofcompositepaladium，paladium－nickelandgoldelectrodeosits．PlatingandSurfaceFinishing，1992，79（2）：49～5510EnyoM，BiswasPC．Hydrogenabsorptioninpaladiumelectrodesinalkalinesolution．J．Electroanal．Chem．，1992，335：309～31911GrimmRD，LandoltD．Investigationoftheinfluenceofpulseparametersoncrackformationinpaladi－umelectrodeposits．SurfaceandCoatingsTechnology，1987，31（2）：151～16112MartinJL，TobenMP．Paladiumandpaladiumaloyelectrodepositsintheelectronicsindustry．MetalFinishing，1990，88（1）：39～4113GrahamAH，Pike－BiegunskiMJ，UpdegraffSW．Evaluationofpaladiumsubstitutesforgold．Plat－ingandSurfaceFinishing，1983，70（11）：52～5714FukumotoY，KawashimaY，HandaK，HayashiY．Pulsecurrentelectrodepositionofpaladium．MetalFinishing，1984，82（9）：77～8015MartinJL，McCaskieJE，TobenMP．Paladiumplating．USpatent4，622，110（Nov．11，1986）and4，545，868（Oct．8，1985）16FredINovel，JamesLMartin，MichaelPToben．Alkalinebathsandmethodsforelectrodepositionofpaladiumandpaladiumaloys．EuropeanPatentApplication0225422（June6，86）17FredINovel，SandsPoint，JamesLMartinelal．Alkalinebathsandmethodsforelectrodepositionofpaladiumandpaladiumaloys．USPatent4，741，818（May5，1988）18AbysJAetal．Paladiumcomplexant．USPatent4，911，798（Mar．27，1990）19AbysJAetal．Paladiumadditives．USPatent4，911，799（Mar．27，1990）20FranklinTC．Somemechanismsofactionofadditivesinelectrodepositionprocesses．SurfaceandCoat－ingsTechnology，1987，30：415～42821周绍民等编著．金属电沉积—原理与研究方法．上海：上海科学技术出版社，1987，284～30522FletcherS．Somenewformulaeaplicabletoelectrochemicalnucleationgrowth／colision．ElectrochimicaActa，1983，28（7）：917～92323ScharifkerB，HilsG．Theoreticalandexperimentalstudiesofmultiplenucleation．ElectrochimicaActa，1983，28（7）：879～889
Included in
Engineering Science and Materials Commons, Materials Chemistry Commons, Materials Science and Engineering Commons, Physical Chemistry Commons
