XRD Study on Highly Preferred Orientation Cu Electrodeposit

Authors

Min GU, Department of Chemistry,State Key Laboratory for Physical Chemistry of Solid Surfaces, Institute o
Fang-zu YANG, Department of Chemistry,State Key Laboratory for Physical Chemistry of Solid Surfaces, Institute o
Ling HUANG, Department of Chemistry,State Key Laboratory for Physical Chemistry of Solid Surfaces, Institute o
Shi-bing YAO, DDepartment of Chemistry,State Key Laboratory for Physical Chemistry of Solid Surfaces, Institute o
Shao-min ZHOU, Department of Chemistry,State Key Laboratory for Physical Chemistry of Solid Surfaces, Institute o

Abstract

Copper electrodeposit was obtained in CuSO 4+H 2SO 4 electrolyte solution by electrodeposition and its structure was studied by XRD.The results showed that copper electoddeposits with the highly preferred orientations of (220)and (111) could be obtained at current density 4.0 A/dm 2 and 15.0 A/dm 2,respectively. The texture coefficient ( TC ) values were increased by thickness of Cu deposits. The thickness would be, to obtain Cu electrodeposit with(111) highly preferred orientation,about 7 times of that of (220) highly preferred orientation, which indicated that(220) face was easier to be remained than (111)face and that electrocrystallization of Cu at low current density would be easier controlled by electrodeposition condition.The higher deposition current density was benefit to nuclei formation. The Cu deposit was presented in the distortion and increase of crystal lattice.

Keywords

Electrodeposition, Cu deposit

DOI Link

https://doi.org/10.61558/2993-074X.3298

Publication Date

2002-08-28

Online Available Date

2002-08-28

Revised Date

2002-08-28

Received Date

2002-08-28

Recommended Citation

Min GU, Fang-zu YANG, Ling HUANG, Shi-bing YAO, Shao-min ZHOU. XRD Study on Highly Preferred Orientation Cu Electrodeposit[J]. Journal of Electrochemistry, 2002 , 8(3): Article 13.
DOI: 10.61558/2993-074X.3298
Available at: https://jelectrochem.xmu.edu.cn/journal/vol8/iss3/13

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