Abstract
The electronic properties of the passive film on REBAR electrodes in simulatedcement pore solution (pH=9.0~13.8) have been investigated using in-situ photoelectrochemical methods. The results show that the passive film is composed of mixed oxides of ferrum, and it is an amorphous, n-type semiconductive film. Variations of pH values, ions in the solution and film-formation potentials can affect the composition of the films. There are two main stages in the growthof the film, with two rate functions characterized by linear relation between the film thickness and thelogarithm of time. The addition of inhibitor NaNO2 changes the composition, structure and growth kinetics of the film, and therefore improves the resistance of pitting corrosion induced by chloride.
Keywords
Passive films on REBAR, Photoelectrochemistry, Simulated cement poresolution, Laser scanning photoelectrochemical microscopy
Publication Date
1995-08-28
Online Available Date
1995-08-28
Revised Date
1995-08-20
Received Date
1995-04-13
Recommended Citation
Wei Chu, Yuanxiang Shi, Baoming Wei, Yong Yang, Xuguang Chen, Zugeng Lin.
The Photoelectrochemical Studies of Passive Films on REBAR Electrodes in Simulated Cement Pore Solution[J]. Journal of Electrochemistry,
1995
,
1(3): 291-297.
DOI: 10.61558/2993-074X.1297
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol1/iss3/9
Included in
Computational Chemistry Commons, Engineering Science and Materials Commons, Materials Chemistry Commons, Physical Chemistry Commons, Power and Energy Commons, Semiconductor and Optical Materials Commons