The Photoelectrochemical Studies of Passive Films on REBAR Electrodes in Simulated Cement Pore Solution

Authors

Wei Chu, Nanjing Institute of Chemical Technology,Dept.of Applied Chemistry, Nanjing 210009)Yang Yong;Chen Xuguang;Lin Zugeng(State Key Laboratory for Physical Chemistry of the Solid Surface,Dept. of Chemistry,Xiamen University,X;
Yuanxiang Shi, Nanjing Institute of Chemical Technology,Dept.of Applied Chemistry, Nanjing 210009)Yang Yong;Chen Xuguang;Lin Zugeng(State Key Laboratory for Physical Chemistry of the Solid Surface,Dept. of Chemistry,Xiamen University,X;
Baoming Wei, Nanjing Institute of Chemical Technology,Dept.of Applied Chemistry, Nanjing 210009)Yang Yong;Chen Xuguang;Lin Zugeng(State Key Laboratory for Physical Chemistry of the Solid Surface,Dept. of Chemistry,Xiamen University,X;

Abstract

The electronic properties of the passive film on REBAR electrodes in simulatedcement pore solution(pH=9.0～13.8)have been investigated using in-situ photoelectrochemicalmethods.The results show that the passive film is composed of mixed oxides of ferrum ,and it is anamorphous,n-type semiconductive film. Variations of pH values,ions in the solution and film-formation potentials can affect the composition of the films. There are two main stages in the growthof the film,with two rate functions characterized by linear relation between the film thickness and thelogarithm of time.The addition of inhibitor NaNO_2 changes the composition,structure and growthkinetics of the film,and therefore improves the resistance of pitting corrosion induced by chloride.

Keywords

Passive films on REBAR, Photoelectrochemistry, Simulated cement poresolution, Laser scanning photoelectrochemical microscopy

DOI Link

https://doi.org/10.61558/2993-074X.1297

Publication Date

1995-08-28

Online Available Date

1995-08-28

Revised Date

1995-08-28

Received Date

1995-08-28

Recommended Citation

Wei Chu, Yuanxiang Shi, Baoming Wei. The Photoelectrochemical Studies of Passive Films on REBAR Electrodes in Simulated Cement Pore Solution[J]. Journal of Electrochemistry, 1995 , 1(3): 291-297.
DOI: 10.61558/2993-074X.1297
Available at: https://jelectrochem.xmu.edu.cn/journal/vol1/iss3/9