Abstract
A self-assembled monolayer of (3-mercaptopropyl) trimethoxysilane(MPTS) was formed on a electrochemical polished copper surface electrode. The corrosion protection abilities of the monolayer were evaluated in 5% NaCl solution using electrochemical linear polarization. The effects of deposition time and silane concentration on corrosion of copper were also discussed. The surface structure of MPTS films was measured by FT-IR and SEM. It was found that the corrosion resistance of copper was reduced markedly owing to the MPTS monolayers formation on copper. The MPTS monolayer retarded the reduction of dissolved oxygen and inhibited the growth of copper oxide in the NaCl solution. FT-IR results indicated the linkages of siloxane on copper suraface. The presenceof (CH_(3)O)_(3)Si (CH_(2)) _(3)SHincreased the inhibition efficiency at every concentration.
Keywords
Self-Assembled Monolayers (SAMs), (3-Mercaptopropyl) trimethoxysilane, Anticorrosion, (Inhibition) efficiency
Publication Date
2005-05-28
Online Available Date
2005-05-28
Revised Date
2005-05-28
Received Date
2005-05-28
Recommended Citation
HUANGLing HUANGLing, Ke-fa LIN, Fang-zu YANG, Shu-kai XU, Shao-min ZHOU.
Structure and Corrosion Electrochemical Properties of Self-assembled (3-Mercaptopropyl) Trimethoxysilane Films on Copper Electrode[J]. Journal of Electrochemistry,
2005
,
11(2): 188-192.
DOI: 10.61558/2993-074X.1638
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol11/iss2/14
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