Abstract
The effects of ethylenediamine stabilizer on the deposition rate and on the stability of the plating bath for electroless deposition of Ni-B alloy were investigated.It was found that the addition of ethylenediamine greatly enhances the stability of the electroless plating bath.The electrochemical polarization including cathodic and anodic polarizations measurements were carried out to examine the effect of ethylenediamine on the deposition process.The results show that ethylenediamine affects both the cathodic and the anodic polarization processes.The oxidation current of the reducer and the reduction current of Ni-B alloy decrease greatly when ethylenediamine was added into the plating bath.The infrared spectroscopy(IR) experiments were carried out to investigate the mechanism of ethylenediamine on the deposition process.It was found that ethylenediamine restrains the oxidation of the reducer owing to its chemically adsorbing on the nickel substrate,which greatly decreases the deposition rate.
Keywords
Electroless deposition, Ni-B alloy, Ethylenediamine, Electrochemical polarization, IR spectrum
Publication Date
2005-11-28
Online Available Date
2005-11-28
Revised Date
2005-11-28
Received Date
2005-11-28
Recommended Citation
Sen-lin WANG.
The Mechanism of Ethylenediamine on Electroless Ni-B Alloy Deposition[J]. Journal of Electrochemistry,
2005
,
11(4): 430-434.
DOI: 10.61558/2993-074X.1682
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol11/iss4/15
References
[1]Gorbunova K M,Lvanov M V,Moiseev V P.E lectrolessdeposition of n ickel-boron alloy[J]J.E lectrochem.Soc.,1973,120(5):613.
[2]Zhang H Z,Zhang X J,Zhang Y K.Strucure and proper-ties of electroless n ikel-boron alloy[J].P lating&Sur-face F in ish ing,1993,April:80.
[3]G iampaolo A R D i,O rdonez J G,Gugliem acc i JM,et al.E lectroless n ickel-boron coatings on m etal carb ides[J].Surface&Coatings Technology,1997,89:127.
[4]Delaunois F,L ienard P.Heat treatm ents for electrolessn ickel-boron p lating on alum in ium alloys[J].Surface&Coatings Technology,2002,160:239.
[5]Ohno I.E lectrochem istry of p lating[J].M aterials Soc.Eng.,1991,A146(33):33.
[6]Paunovic M.E lectrochem ical aspects of electroless depo-sition ofm etal[J].P lating,1968,55:1161.
[7]W u Jin-Guang(吴谨光)Ch ief-Edr.Technology andApp lication ofModern Fourier Transform Irfrared Spec-trum(近代傅立叶变换红外光谱技术及应用)[M].Be ijing(北京):L iterature of Sc ience and TechnologyPress,1994.
Included in
Engineering Science and Materials Commons, Materials Chemistry Commons, Materials Science and Engineering Commons, Physical Chemistry Commons