PDMS Regularly Superhydrophobic Surfaces Prepared by ICP Etching Silicon Model

Authors

Run-xiang ZHANG, College of Chemistry and chemical engineering,Xiamen University,Xiamen 361005,Fujian,China,;
Yu-long ZHANG, Pen-Tung Sah Micro-Electro-Mechanical Systems Research Center of Xiamen University,Xiamen University,Xiamen 361005,Fujian,China;
Hua-shui LIN, College of Chemistry and chemical engineering,Xiamen University,Xiamen 361005,Fujian,China,;

Corresponding Author

Hua-shui LIN

Abstract

A series of different dimensions regularly micropillar array hydrophobic Poly(dimethylsiloxane)(PDMS) surfaces were obtained by peeling off PDMS which was poured onto the silicon models.The silicon models were prepared by ICP etching technology.The results indicate that the water contact angle(WCA) was increased with the size and the height of the mocropillar,decreased with increasing the distance of the mocropillar when the height of the micropillar was relative small;if the height of the micropillar was relative big,WCA was decreased with increasing the size of micropillar,meanwhile,the distance of the micropillar was a complex factor to WCA,and the height of the micropillar have little influence.The biggest of WCA on this micopillar array PDMS surface can reach to about 151° when the size,distance,height of the micropillar were 14μm,6μm,14μm respectively.

Keywords

ICP etching, silicon model, PDMS, superhydrophobic

DOI Link

https://doi.org/10.61558/2993-074X.1819

Publication Date

2007-08-28

Online Available Date

2007-08-28

Revised Date

2007-08-28

Received Date

2007-08-28

Recommended Citation

Run-xiang ZHANG, Yu-long ZHANG, Hua-shui LIN. PDMS Regularly Superhydrophobic Surfaces Prepared by ICP Etching Silicon Model[J]. Journal of Electrochemistry, 2007 , 13(3): 264-268.
DOI: 10.61558/2993-074X.1819
Available at: https://jelectrochem.xmu.edu.cn/journal/vol13/iss3/7