Abstract
In the bath of the electroless copper plating using sodium hypophosphite as reductant,the effects of 2,2′-dipyridine on the deposition rate,anodic oxidation of sodium hypophosphite,cathodic reduction of copper ions,surface morphologies,structure and the existing status of the deposit components were examined.The results showed that,2,2′-dipyridine hindered the electroless deposition.Experiments of liner sweep voltammetry(LSV) indicated that,as the addition of 2,2′-dipyridine to the electrolyte,the oxidation peak potential of sodium hypophosphite shifted to a more negative value but the peak current decreased;the reducing peak potential of copper ions moved to a more negative value whereas the peak current increased.Scanning electron microscope(SEM)、energy dispersive spectroscopy(EDS)、X-ray diffraction(XRD) and X-ray photoelectron spectroscopic(XPS) experiments displayed that,the additive caused the deposit in the compacter,brighter and lower nickel content.the deposit was Cu-Ni alloy in face-centered cubic structure without obvious crystal face preferred orientation.the copper and nickel in the deposit were in metal state,and the weight content of phosphorus was less than 0.05%.
Keywords
electroless copper plating;sodium hypophosphite, 2, 2′-dipyridine
Publication Date
2007-11-28
Online Available Date
2007-11-28
Revised Date
2007-11-28
Received Date
2007-11-28
Recommended Citation
Bin YANG, Fang-zu YANG, Ling HUANG, Shu-kai XU, Guang-hua YAO, Shao-min ZHOU.
Research of 2,2′-dipyridine on Electroless Copper Plating Using Sodium Hypophosphite as Reductant[J]. Journal of Electrochemistry,
2007
,
13(4): 425-430.
DOI: 10.61558/2993-074X.1847
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol13/iss4/14
References
[1]Cheng D H,Xu W Y,Zhang Z Y,et al.Electrolesscopper plating using hypophosphite as reducing agent[J].Met Finish,1997,95(1):34-37.
[2]Huang A,Chen K M.Mechanism of hypophosphite-re-duced electroless copper plating[J].J ElectrochemSoc,1989,136(1):72-75.
[3]Silvain J F,Chazelas J,Trombert S J.Copper electro-less deposition on NiTi shape memory alloy:an XPSstudy of Sn?Pd?Cu growth[J].Applied Surface Sci-ence,2000,153(4):211-221.
[4]Chu S Z,Sakairi M,Takahashi H.Copper electrolessplating at selected areas on aluminum with pulsed Nd-YAG laser[J].J Electrochem Soc,2000,147(4):1423-1434.
[5]Shacham-Diamand Y,Lopatin S.Integrated electrolessmetallization for ULSI[J].Electrochimica Acta,1999,44(21-22):3639-3649.
[6]Norkus E,Vaaakelis A,Jaaaiauskienaa J,et al.Obtai-ning of high surface roughness copper deposits by elec-troless plating technique[J].Electrochimica Acta,2006,51(17):3495-3499.
[7]Li J,Kohl P A.The acceleration of nonformaldehydeelectroless copper plating[J].J Electrochem Soc,2002,149(12):C631-C636.
[8]Li J,Kohl P A.The deposition characteristics of accel-erated nonformaldehyde electroless copper plating[J].J Electrochem Soc,2003,150(8):C558-C562.
[9]Wang Z L,Obata R,Sakaue H.Bottom-up copper fillwith addition of mercapto alkyl carboxylic acid in elec-troless plating[J].Electrochimica Acta,2006,51(12):2442-2446.
[10]Ohno I,Wakabayash O,Haruyama S.Anodic oxida-tion of reductants in electroless plating[J].J Electro-chem Soc,1985,132:2323.
[11]Yang F Z(杨防祖),Yang B(杨斌),Wu L Q(吴丽琼),et al.Studies on Cu-Ni alloy electroless platingusing sodium hypophosphite as reductant[J].Electro-plating and Finishing(in Chinese),2006,25(7):1-3.
[12]Yang F Z(杨防祖),Yang B(杨斌),Lu B B(陆彬彬),et al.Electrochemical study of electroless copperplating using sodium hypophosphite as reductant[J].Acta Physico-Chimica Sinica,2006,22(11):1317-1320.
[13]Norkus E,Vaskelis A,Jaciauskiene J,et al.Environ-mentally friendly natural polyhydroxylic compounds inelectroless copper plating baths:application of xylitol,D-mannitol and D-sorbitol as copper(II)ligands[J].J Applied Electrochemistry,2005,35:41-47.
[14]Wu L Q(吴丽琼),Yang F Z(杨防祖),Huang L(黄令),et al.An electrochemical study of electroless cop-per plating using glyoxylic acid as reducing agent[J].Electrochemistry(in Chinese),2005,11(4):402-406.
[15]Feldstein N,Lancsek TS.A newtechnique for inves-tigating the electrochemical behavior of electroless plat-ing bath and the mechanism of electroless nickel plat-ing[J].J Electrochem Soc,1971,118(6):869-874.
[16]Hu Guanghui(胡光辉),Wu Huihuang(吴辉煌),Yang Fangzu(杨防祖).Effect of additives on electro-less deposition rate[J].Acta Physico-Chimica Sinica(in Chinese),2004,20(3):327-330.
[17]Nuzzi F J.Accelerating the rate of electroless copperplating[J].Plating and Surface Finishing,1983,70(1):51-54.
[18]Hung A.Effects of thiourea guanidine hydrochloride onelectroless copper plating[J].J Electrochem Soc,1985,132(5):1047-1049.
[19]Briggs D,Seah MP.Practical surface analysis,X-rayphotoelectron spectroscopy[M].Wiley,Vol.1,1990.608.
Included in
Materials Chemistry Commons, Materials Science and Engineering Commons, Physical Chemistry Commons