Ion-implanting Modification of Layered Manganese Dioxide and Its Electrochemical Performance

Authors

He-ning HUANG, Department of Chemical and Biological Engineering,Collage of Sanming,Sanming 365004,Fujian,China,;State Key Lab for Physical Chemistry of solid Surface,Department of Chemistry,Xiamen University,Xiamen 361005,Fujian,China;
Dong-ping LV, State Key Lab for Physical Chemistry of solid Surface,Department of Chemistry,Xiamen University,Xiamen 361005,Fujian,China;
Xing-kang HUANG, State Key Lab for Physical Chemistry of solid Surface,Department of Chemistry,Xiamen University,Xiamen 361005,Fujian,China;
Qi-wei ZHANG, Department of Chemical and Biological Engineering,Collage of Sanming,Sanming 365004,Fujian,China,;
Yong YANG, State Key Lab for Physical Chemistry of solid Surface,Department of Chemistry,Xiamen University,Xiamen 361005,Fujian,China;

Abstract

Layered MnO2(δ-MnO2) was prepared by thermal decomposition of potassium permanganate.Ti was ion-implanted into such δ-MnO2 by physical techniques,forming a composite(δ-MnO2-Ti).These materials were characterized by XRD,SEM,XPS techniques and their electrochemical proprieties were investigated.The results showed that the layered structure of δ-MnO2 did not been destroyed after Ti ion implantation,and the implanted Ti element was mainly Ti4+ as indicated by XPS.Both of the first and the highest discharge specific capacities of the ion-implanted layered MnO2(δ-MnO2-Ti),compared to those of δ-MnO2,were improved significantly.

Keywords

layered MnO2, ion implantation, surface structure, electrochemical performance

DOI Link

https://doi.org/10.61558/2993-074X.1849

Publication Date

2007-11-28

Online Available Date

2007-11-28

Revised Date

2007-11-28

Received Date

2007-11-28

Recommended Citation

He-ning HUANG, Dong-ping LV, Xing-kang HUANG, Qi-wei ZHANG, Yong YANG. Ion-implanting Modification of Layered Manganese Dioxide and Its Electrochemical Performance[J]. Journal of Electrochemistry, 2007 , 13(4): 436-440.
DOI: 10.61558/2993-074X.1849
Available at: https://jelectrochem.xmu.edu.cn/journal/vol13/iss4/16

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