The Influence of the Sputtering Power on the Structural and Electrochemical Properties of Tin Oxide Films

Authors

Min-zhen CAI, Department of Physics,Xiamen University,Xiamen 361005,Fujian,China;
Jie SONG, School of Chemistry and Chemical Engineering,Xiamen University,Xiamen 361005,Fujian,China;
Ming-sen ZHENG, School of Chemistry and Chemical Engineering,Xiamen University,Xiamen 361005,Fujian,China;
Qi-hui WU, Department of Physics,Xiamen University,Xiamen 361005,Fujian,China;
Sun-tao WU, Pen Tung Sah MEMS Research Center,Xiamen University,Xiamen 361005,Fujian,China;
Quan-Feng Dong, School of Chemistry and Chemical Engineering,Xiamen University,Xiamen 361005,Fujian,China;

Abstract

Tin oxide films were deposited on silicon substrates at room temperature using the radio frequency(RF) magnetron sputtering with different sputtering power.The influence of sputtering power upon the crystal structure,surface morphology and electrochemical properties of tin oxide films were then investigated.The XRD and SEM results illustrate that the phase of tin oxide thin films changed from amorphous to crystalline and the grain size augments with the increase of the sputtering power.The constant current charge and discharge cycle tests imply that the initial irreversible capacity loss of Li/tin oxide batteries increase and which capacity decrease as the sputtering power increases.The sputtering power has a great influence upon the structural and electrochemical properties of tin oxide films.

Keywords

tin oxide films, the anode material, RF magnetron sputtering, electrochemical property

DOI Link

https://doi.org/10.61558/2993-074X.1865

Publication Date

2008-02-28

Online Available Date

2008-02-28

Revised Date

2008-02-28

Received Date

2008-02-28

Recommended Citation

Min-zhen CAI, Jie SONG, Ming-sen ZHENG, Qi-hui WU, Sun-tao WU, Quan-Feng Dong. The Influence of the Sputtering Power on the Structural and Electrochemical Properties of Tin Oxide Films[J]. Journal of Electrochemistry, 2008 , 14(1): 66-70.
DOI: 10.61558/2993-074X.1865
Available at: https://jelectrochem.xmu.edu.cn/journal/vol14/iss1/14

References

[1]Dudney N J,Neudecker B J.Solid state thin-film lithi-um battery systems[J].Current Opinion in Solid andMaterials Science,1999,4:479-482.
[2]Kanehori K,Matsumoto K,Miyauchi K,et al.Thinfilm solid electrolyte and its application to secondarylithium cell[J].Solid State Ionics,1983,(9~10):1445-1448.
[3]Park K S,Park Y J,Kim MK,et al.Characteristics oftin nitride thin-film negative electrode for thin-film mi-crobattery[J].J Power Sources,2001,103:67-71.
[4]Nam S C,Paik C H,Cho W L,et al.Electrochemicalcharacterization of various tin-based oxides as negativeelectrodes for rechargeable lithium batteries[J].J PowerSources,1999,84:24-31.
[5]Ristoscu C,Cultrera L,Dima A,et al.SnO2nano-structured films obtained by pulsed laser ablation depo-sition[J].Applied Surface Science,2005,247:95-100.
[6]Santos-Pena J,Brousse T,Sanchez L,et al.Antimonydoping effect on the electrochemical behavior of SnO2thin film electrodes[J].J Power Sources,2001,(97-98):232-234.
[7]Maranchi J P,Hepp A F,Kumta P N,et al.LiCoO2and SnO2thin film electrodes for lithium-ion battery ap-plications[J].Materials Science and Engineering,2005,116:327-340.
[8]Gubbins M A,Casey V,Newcomb S B.Nanostructuralcharacterisation of SnO2thin films prepared by reactiver.f.magnetron sputtering of tin[J].Thin Solid Films,2002,405:270-275.
[9]Courtiney I A,Dahn J R.Electrochemical and in SituX-ray diffraction studies of the reaction of lithium withtin oxide composites[J].J Electrochem Soc,1997,144(6):2045-2052.
[10]Kim Y I,Lee W H,Moon HS,et al.Effect of Si ad-dition to thin-film SnO2microbattery anodes on cyclingperformance[J].Journal of Power Sources,2001,101:253-258.