Abstract
Tin oxide films were deposited on silicon substrates at room temperature using the radio frequency(RF) magnetron sputtering with different sputtering power.The influence of sputtering power upon the crystal structure,surface morphology and electrochemical properties of tin oxide films were then investigated.The XRD and SEM results illustrate that the phase of tin oxide thin films changed from amorphous to crystalline and the grain size augments with the increase of the sputtering power.The constant current charge and discharge cycle tests imply that the initial irreversible capacity loss of Li/tin oxide batteries increase and which capacity decrease as the sputtering power increases.The sputtering power has a great influence upon the structural and electrochemical properties of tin oxide films.
Keywords
tin oxide films, the anode material, RF magnetron sputtering, electrochemical property
Publication Date
2008-02-28
Online Available Date
2008-02-28
Revised Date
2008-02-28
Received Date
2008-02-28
Recommended Citation
Min-zhen CAI, Jie SONG, Ming-sen ZHENG, Qi-hui WU, Sun-tao WU, Quan-Feng Dong.
The Influence of the Sputtering Power on the Structural and Electrochemical Properties of Tin Oxide Films[J]. Journal of Electrochemistry,
2008
,
14(1): 66-70.
DOI: 10.61558/2993-074X.1865
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol14/iss1/14
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