An HAp/nanosilver Coating Prepared by Electrochemical Deposition and its Antibacterial Characterization

Authors

Zhi-wang GENG, State Key Laboratary of Physical Chemistry of Solid Surface,Department of Chemistry,College of Chemistry and Chemical Engineering,Xiamen Universtiy,Xiamen 361005,Fujian,China;
Hui WANG, State Key Laboratary of Physical Chemistry of Solid Surface,Department of Chemistry,College of Chemistry and Chemical Engineering,Xiamen Universtiy,Xiamen 361005,Fujian,China;
Chang-jian LIN, State Key Laboratary of Physical Chemistry of Solid Surface,Department of Chemistry,College of Chemistry and Chemical Engineering,Xiamen Universtiy,Xiamen 361005,Fujian,China;

Abstract

The silver nanoparticles were prepared by sodium citrate reduction of AgNO3.The nanoparticles were electrophoretic deposited on titanium,followed by the electrolytic deposition of hydroxyapatite(HAp).It is revealed,by the high-resolution transmission electron microscopy(HRTEM),that the diameters of nanosilver particles ranged from 5nm to 20nm.The XPS and XRD indicated the coating consisting of silver and HAp.According to the SEM images and antibacterial test,it is demonstrated that when the concentrations of the electrophoretic solution became higher more silver particles were depostited,and the antibacterial property improved.However,the particles aggregated on titanium greatly when the concentration exceeded a point,and the antibacterial activity declined.The optimum concentration for the antibacterial property of the material was determined.

Keywords

nanosilvers, hydroxyapatite, antibacterial, titanium

DOI Link

https://doi.org/10.61558/2993-074X.1899

Publication Date

2008-08-28

Online Available Date

2008-08-28

Revised Date

2008-08-28

Received Date

2008-08-28

Recommended Citation

Zhi-wang GENG, Hui WANG, Chang-jian LIN. An HAp/nanosilver Coating Prepared by Electrochemical Deposition and its Antibacterial Characterization[J]. Journal of Electrochemistry, 2008 , 14(3): 243-247.
DOI: 10.61558/2993-074X.1899
Available at: https://jelectrochem.xmu.edu.cn/journal/vol14/iss3/3