Abstract
The texturization of(100) crystalline silicon(c-Si) wafer was studied by field-emission scanning electron microscope using different kinds of etchant: sodium hydroxide,sodium carbonate and tribasic sodium phosphate.By optimizing the etching parameters,the lowest values of averaged reflectance(Rav) were obtained to be 9.70% for NaOH,9.76% for Na2CO3 and 8.63% for Na3PO4·12H2O,which is comparable to that of the wafer with textured surface covered with an anti-reflection coating of either silicon nitride or thermally grown silicon dioxide.The relation of Rav and surface morphology of textured wafer was analyzed.Moreover,special emphasis was put on the role of isopropyl alcohol(IPA) and sodium bicarbonate for texturization.It is proved that IPA decreased the etching rate but improved the morphology of the textured surface.It seems that played NaHCO3 played the similar role of IPA but resulted in the formation of large pyramid.The mechanism of texturization by different kinds of etchant was suggested.
Keywords
crystalline silicon, texturization, alkaline, reflectance, surface morphology
Publication Date
2008-11-28
Online Available Date
2008-11-28
Revised Date
2008-11-28
Received Date
2008-11-28
Recommended Citation
Yu-hua DOU, Yu-qin ZHOU, Mei-fang ZHU, Shuang SONG, Feng-zhen LIU, Jin-long LIU, Zhan-jun ZHANG.
Study on the Texturization of c-Si Wafers by Different Kinds of Alkaline for Heterojunction Solar Cells[J]. Journal of Electrochemistry,
2008
,
14(4): 358-364.
DOI: 10.61558/2993-074X.1921
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol14/iss4/2
References
[1]Nishimoto Y,Namba K.Investigation of texturizationfor crystalline silicon solar cells with sodium carbonatesolutions[J].Solar Energy Material&Solar Cells,2000,61:393-402.
[2]Sparber W,Schultz O,Biro D,et al.Comparison oftexturing methods for crystalline silicon solar cells usingKOHand Na2CO3.In:3rd World Conference on Pho-tovoltaic Energy Conversion[C].Osaka,2003.1372-1375.
[3]Marrero N,Gonz lez-D az B,Guerrero-Lemus R,et al.Optimization of sodium carbonate texturization on large-area crystalline silicon solar cells[J].Solar EnergyMaterials&Solar Cells,2007,(91):1943-1947.
[4]Vallejo B,Gonzalez-Man s M,Martnez-Lopez J,et al.On the texturization of monocrystalline silicon with sodi-um carbonate solutions[J].Solar Energy,2007,(81):565-569.
[5]Xi Zhenqiang,Yang Deren,Que Duanlin.Texturizationof monocrystalline silicon with tribasic sodium phos-phate[J].Solar Energy Mater Solar Cells,2003,77:255-263.
[6]Gangopadhyay U,Kim K H,Dhungel S K,et al.Ano-vel lowcost texturization method for large area commer-cial mono-crystalline silicon solar cells[J].Solar Ener-gy Materials&Solar Cells,2006,90:3557-3567.
[7]Irena Zubel,Malgorzata Kramkowska.The effect of iso-propyl alchohol on etching rate and roughness of(100)Si surface etched in KOH and TMAH solution[J].Sensors and Actuators A,2001,93:138-174.
[8]Declercq MJ,Gerzberg L,Meindl J D.Optimization ofthe hydrazine-water for anisotropic etching of silicon inintegrated circuit technology[J].J Electrochem Soc,1975,122(4):545-552.
[9]Restrepo F,Backus C E.On black solar cells or thetetrahedral texturing of silicon surface[J].IEEE TransElectron Dev,1976,ED-23(10):1195-1197.
[10]Seidel H,Csepregi L,Heuberger A,et al.Anisotrop-ic etching of crystalline silicon in alkaline solutionⅠ:Orientation dependence and behavior of passivation lay-ers[J].J Electrochem Soc,1990,137(11):3612.
Included in
Physical Chemistry Commons, Power and Energy Commons, Semiconductor and Optical Materials Commons
