Influence of Nano-Al_2O_3 Particles in Nickel Electro-crystallization Process

Authors

Cheng-yu TAN, Key Laboratory of Ministry of Education for Material Science and Engineering,Central-South University,Changsha 410083,China;
Wei HU, Key Laboratory of Ministry of Education for Material Science and Engineering,Central-South University,Changsha 410083,China;
Hang CUI, Key Laboratory of Ministry of Education for Material Science and Engineering,Central-South University,Changsha 410083,China;
Yu LIU, Key Laboratory of Ministry of Education for Material Science and Engineering,Central-South University,Changsha 410083,China;

Abstract

The influence of nano-Al2O3 particles in nickel electro-deposition on copper matrix from acid sulphate solution was studied under various potentials by using cyclic voltammetry(CV) and chronoamperometry(CA).The results show that the beginning potential of electro-deposition was about-740 mV(vs.SCE) for Ni-Al2O3 solution system.With the step-potential moving to the negative direction,the nucleation time of electro-deposition for Ni-Al2O3 solution system was shortened gradually.Compared with that of pure Ni deposition system,the nucleation time tm,corresponding to the peak current of Ni-Al2O3 deposition system was apparently shortened under the lower step-potential:-740~-830 mV,which indicates that Al2O3 particles promote the nucleation process of nickel electro crystallization.Under the step-potential of-890 mV(vs.SCE),the electro-deposition nucleation of Ni-Al2O3 solution system in the initial stage meets the instantaneous Scharifker-Hill model with three-dimensional.

Keywords

Ni-nanoAl2O3 coating, electro-crystallization nucleation, I～t curve

DOI Link

https://doi.org/10.61558/2993-074X.1986

Publication Date

2009-05-28

Online Available Date

2009-05-28

Revised Date

2009-05-28

Received Date

2009-05-28

Recommended Citation

Cheng-yu TAN, Wei HU, Hang CUI, Yu LIU. Influence of Nano-Al_2O_3 Particles in Nickel Electro-crystallization Process[J]. Journal of Electrochemistry, 2009 , 15(2): 228-232.
DOI: 10.61558/2993-074X.1986
Available at: https://jelectrochem.xmu.edu.cn/journal/vol15/iss2/21