The Electrochemical Behavior of Daunorubicin Hydrochloride on Galactic Disk Electrode and its Reaction with BSA

Authors

Hong-fen CHENG, School of Chemistry and Chemical Engineering,Shanxi University,Taiyuan 030006,China;
Yong ZHang, School of Chemistry and Chemical Engineering,Shanxi University,Taiyuan 030006,China;
Jie LIU, School of Chemistry and Chemical Engineering,Shanxi University,Taiyuan 030006,China;
Yan-mei LIU, School of Chemistry and Chemical Engineering,Shanxi University,Taiyuan 030006,China;

Abstract

This article used the linear sweep voltammetry and the circulation voltammetry to study the electrochemical behavior of daunorubicin hydrochloride on galactic disk electrode and its electrode reaction with BSA.Also it studied the interaction of daunorubicin hydrochloride with BSA.The results showed that daunorubicin hydrochloride has a sensitive reduction peak at -0.64 V(vs. SCE) in pH 6.50 Britton-Robinson buffer.The valus of reductions peak current reduced by the addition of BSA to the above mentioned solution.A new electrochemical determination method of bovine serum albumin was developed based on the interaction of daunorubicin hydrochloride with BSA.Furthermore,under the optimized condition,the decrease of the reduction peak current of daunorubicin hydrochloride is proportional to the concentration of BSA in the range of 5.0×10-8 mol·L-1~1.0×10-4 mol·L-1(r=0.9965).The limit of detection is 5.0×10-9 mol·L-1.The binding ratio and binding constant of daunorubicin hydrochloride with BSA were calculated.

Keywords

daunorubicin hydrochloride, galactic disk electrode, electrochemical behavior, bovine serum albumin(BSA)

DOI Link

https://doi.org/10.61558/2993-074X.2004

Publication Date

2009-08-28

Online Available Date

2009-08-28

Revised Date

2009-08-28

Received Date

2009-08-28

Recommended Citation

Hong-fen CHENG, Yong ZHang, Jie LIU, Yan-mei LIU. The Electrochemical Behavior of Daunorubicin Hydrochloride on Galactic Disk Electrode and its Reaction with BSA[J]. Journal of Electrochemistry, 2009 , 15(3): 326-330.
DOI: 10.61558/2993-074X.2004
Available at: https://jelectrochem.xmu.edu.cn/journal/vol15/iss3/18

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