Electrodeposition of Cu-Co Multilayer Thin Films

Authors

Jiangyun Xue, College of Fiber Engineering,Zhejiang Institute of Silk Textiles,Hongzhou 310033;
Jixun Wu, Department of Surface Science and Corrosion Engineering,University of Science and Technology,Beijing 100083;
Dejun Yang, Department of Surface Science and Corrosion Engineering,University of Science and Technology,Beijing 100083;

Abstract

A method has been developed to produce Cu-Co Multilayer from a single electrolyte by electredeposition. The effects of the concentration of copper ions,current density and the speed of rotation were investigated,and the Cu-Co electrodeposition films were analysed by TEM. AES and X-ray diffraction.The results indicated that the film was alternating pure copper and coppercobalt alloy layers. If the content of copper in cobalt layer is to be small,the concentration of its ions in solution must be small and the rotation speed must be low.

Keywords

Electro-deposition, Copper-Cobalt alloy, Multilayer

DOI Link

https://doi.org/10.61558/2993-074X.1335

Publication Date

1996-08-28

Online Available Date

1996-08-28

Revised Date

1996-08-28

Received Date

1996-08-28

Recommended Citation

Jiangyun Xue, Jixun Wu, Dejun Yang. Electrodeposition of Cu-Co Multilayer Thin Films[J]. Journal of Electrochemistry, 1996 , 2(3): 274-278.
DOI: 10.61558/2993-074X.1335
Available at: https://jelectrochem.xmu.edu.cn/journal/vol2/iss3/6

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