Improved Etching Resolution on Silicon by the Confined Etchant Layer Technique

Authors

Yanbing Zu, State Key Lab. for Phys. Chem. of the Solid Surf., Dept. of Chem., Xiamen Univ., Xiamen 361005.
Lei Xie, State Key Lab. for Phys. Chem. of the Solid Surf., Dept. of Chem., Xiamen Univ., Xiamen 361005.
Bingwei Mao, State Key Lab. for Phys. Chem. of the Solid Surf., Dept. of Chem., Xiamen Univ., Xiamen 361005.
Jiqian Mu, State Key Lab. for Phys. Chem. of the Solid Surf., Dept. of Chem., Xiamen Univ., Xiamen 361005.
Zhaoxiong Xie, State Key Lab. for Phys. Chem. of the Solid Surf., Dept. of Chem., Xiamen Univ., Xiamen 361005.
Zhaowu Tian, State Key Lab. for Phys. Chem. of the Solid Surf., Dept. of Chem., Xiamen Univ., Xiamen 361005.
Lining Sun, Robost Inst., Univ. of Tech. of Harbin, Harbin 150001.

DOI Link

10.61558/2993-074X.3554

Publication Date

1997-02-28

Online Available Date

1997-02-28

Revised Date

1997-02-28

Received Date

1997-02-28

Recommended Citation

Yanbing Zu, Lei Xie, Bingwei Mao, Jiqian Mu, Zhaoxiong Xie, Zhaowu Tian, Lining Sun. Improved Etching Resolution on Silicon by the Confined Etchant Layer Technique[J]. Journal of Electrochemistry, 1997 , 3(1): 14-14.
DOI: 10.61558/2993-074X.3554
Available at: https://jelectrochem.xmu.edu.cn/journal/vol3/iss1/18