Abstract
The electrocrystallization of Co(2.5 nm)/Pt(2.5 nm) n (n ≥50) multilayer has been carried out under potential control, based on observation of reflection electron microscopy (REM). Monatomic steps on Pt single crystal surfaces have been imaged using a conventional transmission electron microscope in the reflection made. The REM images have revealed three dimintional growth of Co electrocrystallization at high polarization of -1.15 V (vs.Hg/Hg 2SO 4). The structure of the specimen was examined by small or high angle X ray diffration technique. The modulation period of a multilayered structure is 5.0 nm.
Keywords
Electrocrystallization, Co/Pt n multilayer, REM, X ray diffration
Publication Date
1997-08-28
Online Available Date
1997-08-28
Revised Date
1997-08-28
Received Date
1997-08-28
Recommended Citation
Renhe Yin, Weiming Cao, Yanpin Guo, Huifen Ji.
Study of Co(2.5 nm)/Pt(2.5 nm) n(n ≥50) Multilayer by Electrocrystallization[J]. Journal of Electrochemistry,
1997
,
3(3): Article 3.
DOI: 10.61558/2993-074X.3121
Available at:
https://jelectrochem.xmu.edu.cn/journal/vol3/iss3/3
References
1新庄辉也．金属人工格子の磁性とイ云寸道．日本金属学会会报，1992，31：7972常光幸美，林安德．电析による金属人工格子の作制．日本金属学会会报，1992，31（9）：8493JyokoY，KashiwabaraS，HayashiY．Reflectionelectronmicroscopyofcopperelectrocystalizationonplat－inum．Mater．Trans．JIM，1992，33：11494李宗全．反射电子显微术原理和应用．物理，1989，18（12）：7155春山志郎等．化学纟总说NO7分子しべルからみた界面の电化学．日本化学会编．学会出版社センタ，1975：59
