Effect of Saccharin on Crystallization Behavior of Electroless Cobalt Plating

Authors

• Yu-Xin Luo, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119
• Jing-Jing Wang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119
• Lu Wang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119
• Zi-Yi Yan, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119
• Yi Ma, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119
• Xin Bo, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119Follow
• Jing-Shuang Dang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119Follow
• Zeng-Lin Wang, Key Laboratory of Applied Surface and Colloid Chemistry, Ministry of Education; Institute of New Concept Sensors and Molecular Materials; School of Chemistry and Chemical Engineering; Shaanxi Normal University; Xi’an, Shaanxi, China, 710119Follow

Corresponding Author

Xin Bo ([email protected]);
Jing-Shuang Dang ([email protected]);
Zeng-Lin Wang ([email protected])

Abstract

In the process of electroless cobalt plating, the saccharin additive can significantly change the surface morphology, texture orientation, and conductivity of the cobalt coating layer. When the amount of saccharin was 3 mg·L^–1, the cobalt coating transformed from disordered large grains to a honeycomb structure, with a preferred orientation of (002) facet on hexagonal close-packed (HCP) cobalt crystals. The resistivity of the cobalt film decreased to 14.4 μΩ·cm, and further decreased to 10.7 μΩ·cm after the annealing treatment. When the concentration of saccharin was increased, the grain size was gradually refined and a “stone forest” structure was observed, with the preferred orientation remaining unchanged. The addition of saccharin also slightly improves the purity of cobalt coating to a certain extent. Through the study of the crystallization behavior of cobalt electroless plating, saccharin molecules can adsorb to specific c-sites on the cobalt dense crystal plane, inhibiting the growth of abc stacking arrangement and inducing the crystal growth in ab stacking mode, thereby achieving optimal growth of HCP (002) texture.

Graphical Abstract

Keywords

Electroless cobalt plating, Additives, Saccharin, Crystallization behavior

DOI Link

https://doi.org/10.61558/2993-074X.3533

Creative Commons License

This work is licensed under a Creative Commons Attribution 4.0 International License.

Publication Date

2025-08-28

Online Available Date

2025-03-28

Revised Date

2025-02-23

Received Date

2024-12-23

Recommended Citation

Yu-Xin Luo, Jing-Jing Wang, Lu Wang, Zi-Yi Yan, Yi Ma, Xin Bo, Jing-Shuang Dang, Zeng-Lin Wang. Effect of Saccharin on Crystallization Behavior of Electroless Cobalt Plating[J]. Journal of Electrochemistry, 2025, 31(8): 2412231.
DOI: 10.61558/2993-074X.3533
Available at: https://jelectrochem.xmu.edu.cn/journal/vol31/iss8/2