Gold Electrodeposition on Microelectrodes

Authors

Lihua Xiong, State Key Lab. for Phy. Chem. of the Solid Sur., Inst. of Phy, Chem, Dept. of Chem., Xiamen Univ., Xiamen 361005);
Caihui Shi, Dept. of Chem., Jiangxi Normal Univ., Nanchang 330027)Shi Caihui Li Xiaoqni Mao Beigwei*(State Kay Lab. for Phy. Chem. of Solid Suface, Inst. of Phy. Chem., Chem. Dept., Xiamen Univ., Xiamen 361005);
xiaoqin Li, Dept. of Chem., Jiangxi Normal Univ., Nanchang 330027)Shi Caihui Li Xiaoqni Mao Beigwei*(State Kay Lab. for Phy. Chem. of Solid Suface, Inst. of Phy. Chem., Chem. Dept., Xiamen Univ., Xiamen 361005);
Bingwei Mao, Dept. of Chem., Jiangxi Normal Univ., Nanchang 330027)Shi Caihui Li Xiaoqni Mao Beigwei*(State Kay Lab. for Phy. Chem. of Solid Suface, Inst. of Phy. Chem., Chem. Dept., Xiamen Univ., Xiamen 361005);

Abstract

The initial stage electrodeposition behaviors of gold onto glassy carbon and platinum microelectrodes are studied in an acid solution containing AuCl_3using cyclic voltammetry and potential step techniques. The results suggest that gold nucleation on microelectrodes requires a higher driving force with high probability. Within the range of the microelectrode dimension that have been used in the present work, large amount of gold nucleus could be formed at short time scale at overpotentials higher than a threshole value. The It curves from the platinum microelectrode are in consistence with the continuous nucleation model. It has been found that the deosition history of the glassy carbon microelectrode substrate has strong influences on subsequent electrodeposition behavior while the platinum microelectrode does not show such effects.

DOI Link

https://doi.org/10.61558/2993-074X.2673

Publication Date

1998-02-28

Online Available Date

1998-02-28

Revised Date

1998-02-28

Received Date

1998-02-28

Recommended Citation

Lihua Xiong, Caihui Shi, xiaoqin Li, Bingwei Mao. Gold Electrodeposition on Microelectrodes[J]. Journal of Electrochemistry, 1998 , 4(1): Article 8.
DOI: 10.61558/2993-074X.2673
Available at: https://jelectrochem.xmu.edu.cn/journal/vol4/iss1/8