Effects of a Vanadium Compound on the Stability of an Acidic Tin(II) Plating Solution

Authors

Zhen-jiang NIU, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005, China
Fei-feng LIN, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005, China
Fang-zu YANG, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005, China
Shi-bing YAO, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005, China
Shao-min ZHOU, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005, China

Corresponding Author

Zhen-jiang NIU

Abstract

The effects of a vanadium compound on the stability of an acidic solution of tin(Ⅱ) sulfate were studied. The electron spectra of the solutions of stabilizer showed that the vanadium existed mainly in VO²⁺ with a small amount of V³⁺ in the stabilizer. The results of cyclic voltammetry revealed that VO²⁺ can be further reduced to V³⁺ on the cathode surface in potential range -0.2～-0.55 V(vs. SCE) and V³⁺ to V²⁺ at the potential more negative than -0.55 V. Both V³⁺ and V²⁺ can effectively eliminate the dissolved oxygen in the bath hence prevent Sn²⁺ from oxidizing, which remarkably increased the stability of the tin(II) sulfate solution.

Keywords

Vanadiun compound, Acidic tin bath, Stabilization

DOI Link

https://doi.org/10.61558/2993-074X.2732

Publication Date

2001-02-28

Online Available Date

2001-02-28

Revised Date

2000-08-28

Received Date

2000-06-30

Recommended Citation

Zhen-jiang NIU, Fei-feng LIN, Fang-zu YANG, Shi-bing YAO, Shao-min ZHOU. Effects of a Vanadium Compound on the Stability of an Acidic Tin(II) Plating Solution[J]. Journal of Electrochemistry, 2001 , 7(1): 90-95.
DOI: 10.61558/2993-074X.2732
Available at: https://jelectrochem.xmu.edu.cn/journal/vol7/iss1/12