Effects of a Vanadium Compound on the Stability of an Acidic Tin(II) Plating Solution

Authors

Zhen-jiang NIU, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005;
Fei feng LIN, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005;
Fang-zu YANG, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005;
Shi-bing YAO, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005;
Shao min ZHOU, Dept. of Chem., State Key Lab. for Phy. Chem. of Sol. Surf.Inst. of Phys. Chem., Xiamen Univ., Xiamen 361005;

Corresponding Author

Zhen jiang NIU

Abstract

The effects of a vanadium compound on the stability of an acidic solution of tin(Ⅱ) sulfate were studied . The electron spectra of the solutions of stabilizer showed that the vanadium existed mainly in VO 2+ with a small amount of V 3+ in the stabilizer. The results of cyclic voltammetry revealed that VO 2+ can be further reduced to V 3+ on the cathode surface in potential range -0.2～-0.55 V(vs. SCE) and V 3+ to V 2+ at the potential more negative than -0.55 V. Both V 3+ and V 2+ can effectively eliminate the dissolved oxygen in the bath hence prevent Sn 2+ from oxidizing, which remarkably increased the stability of the tin (II) sulfate solution.

DOI Link

https://doi.org/10.61558/2993-074X.2732

Publication Date

2001-02-28

Online Available Date

2001-02-28

Revised Date

2001-02-28

Received Date

2001-02-28

Recommended Citation

Zhen-jiang NIU, Fei feng LIN, Fang-zu YANG, Shi-bing YAO, Shao min ZHOU. Effects of a Vanadium Compound on the Stability of an Acidic Tin(II) Plating Solution[J]. Journal of Electrochemistry, 2001 , 7(1): Article 12.
DOI: 10.61558/2993-074X.2732
Available at: https://jelectrochem.xmu.edu.cn/journal/vol7/iss1/12

References

[1]　LiaoYijia .StudyoftheturbidityproblemofSn Cealloyplatingbath[J].Electroplating&PollutionControl(inChinese) ,1987,7(2 ) :15～ 18.

[2 ]　FanXiao lin ,Daizhen .Anapproachofthemechanismofunstabilityofthesulphateelectroplatingbathforbrighttinplating[J].PlatingandFinishing (inChinese) ,1988,10 (4 ) :10～ 12 .

[3]　LaiLong jun .StudiesonstabilizerofacidbrightSnplating[J].Electroplating&PollutionControl (inChi nese) ,1990 ,10 (2 ) :10～ 13.

[4 ]　ZhangYong qiang ,Liuxing quan .Studyofthesolderabilityoftinalloyandstabilizersforacidictinplating[J].Electroplating&PollutionControl (inChinese) ,1994 ,14(4 ) :3～ 5.

[5]　LiDi,GuWen bin ,TanYing heng ,etc .AstudyonadditivesinacidbrightSnplating[J].MaterialsPro tecting (inChinese) ,1994 ,2 7(9) :7～ 9.

[6 ]　S .C .Furman ,C .S .Garner.AbsorptionSpectraofVanadium (Ⅲ )andVanadium (IV)ionsincomplexingandNon complexingMedia[J].J .Am .Chem .Soc .,1950 ,72 :1785～ 1797.

[7]　M .PrivmanandT .Hepel.Electrochemistryofvanadiumelectrodes.Part 1.Cyclicvoltammetryinaqueoussolutions[J].JElectroanal.Chem .,1995,382 :137～ 144 .

[8]　E .Tsuchida ,K .Oyaizu ,E .LDewi,ect.Anson ,CatalysisoftheElectroreductionofO2 toH2 ObyVanadi um salenComplexesinAcidifiedDichloromethane[J].Inorg .Chem .,1999,38(16 ) :370 4～ 370 8.